Department of systems (nano and microelectric and mechanical  MEMS )  

Step 2: (photoresist) /  (Nano photoresist) 

Researcher  and author: Dr.   (   Afshin Rashid)

Note: (Nano photoresist): a  light-sensitive material (photoresist) is used on the surface of silicon dioxide. This process can be done by rotating the photoresist coating suspended  in a solvent. The result after rotating and  removing the solvent  is a photoresist with a thickness of 0.2 to 2 microns. The photoresist  is completely cooked and soft to remove the solvents from it  .

With the approach of technology  (nano and microelectric and mechanical MEMS)  towards the accumulation of optoelectronic circuits, manufacturing problems and phenomena that helped to prevent further compression of the structure, caused the use of structures  (photoresist) /  (Nano photoresist)  and plasmonic waves to be investigated and used. These nano structures consist of metal and dielectric, whose dimensions are below the excitation wavelength (the wavelength of the radiation that excites the waves  (photoresist) /  (Nano photoresist)  ). (Nano and Micro Electro and Mechanical MEMS)  is based on the process of interaction between electromagnetic waves and conduction electrons in metals with nano dimensions.Analytically, the reason is the rapid drop in energy of electrons passing through metals, and it was concluded that this energy is spent on the cumulative movement and oscillation of the free electrons of the metal. The reason for this naming is the similarity of these electron oscillations with the oscillations of the environment particles  (nano and microelectric and mechanical MEMS) .

The so-called term  (photoresist) /  (Nano photoresist)  is used for the oscillation of the bound electrons of the metal in the state of coupling with the phonons of the incident beam. The name  (photoresist) /  (Nano photoresist)  was used for quasi-particles that were half matter and half photon, which is the coupled state between a photon of the elementary excitation beam and the conduction electrons of the metal, and the term (photoresist) / (  Nano  ) photoresist) is  to express the reason for the coupling between a photon and a  (nano and microelectromechanical MEMS)  .






The division  (nano and micro-electric and mechanical MEMS)  into two areas  (photoresist) /  (Nano photoresist)  is briefly introduced. In  (nano and microelectrical and mechanical MEMS),  the basis of the interactions is nanoparticles, whose properties   have been investigated in stimulating this mode of (photoresist) /  (Nano photoresist) . In (nano and microelectric and mechanical MEMS)  by introducing their working foundation, there is its field formulation and how these structures pass the diffraction limit.  Nanostructures have fundamental differences both in terms of synthesis and production, and in terms of properties and applications. In general, the electrical, optical, magnetic, surface, etc. properties of these three structures are fundamentally different from each other, and of course their applications are also different. One-dimensional nanostructures can be used for electronic connections, while there is no such application for zero-dimensional and two-dimensional nanomaterials. The main basis  (nano and microelectric and mechanical MEMS)  is on the use of materials. Every material in space has three dimensions: length, width and height. If in a material at least one of these three dimensions is in the range of nanometers, it is called a material, a nanostructure.


Conclusion :

With the approach of technology  (nano and microelectric and mechanical MEMS)  towards the accumulation of optoelectronic circuits, manufacturing problems and phenomena that helped to prevent further compression of the structure, caused the use of structures  (photoresist) /  (Nano photoresist)  and (nano and microelectric and mechanical MEMS)  to be investigated and used. These nano structures consist of metal and dielectric, whose dimensions are below the excitation wavelength (the wavelength of the radiation that excites the waves  (photoresist) /  (Nano photoresist)  ).

Researcher  and author: Dr.   (   Afshin Rashid)

Specialized doctorate in nano-microelectronics