(Nanoelectronics - Plasmonics) Nano-focused diaphragm method and electric field distribution in the complex diaphragm structure of an aluminum film at a wavelength of less than 2 nm
Researcher and author: Dr. ( Afshin Rashid)
Note: A plasmonic lithography system with a nano-diaphragm contact probe in the form of (tangled) in a metal film plate coated at the bottom (dimensions less than 10 nm) to produce a 405 nm diode laser beam Focus on the nano diaphragm.
Lithographic systems have achieved such high-resolution nano-aperture transmissions below diffraction, and have begun to develop new designs of plasmonic nanolithography. To achieve high optical resolution, the distance between the aperture and the image resistance must be exactly within the range. Save a few tens of nanometers, because the field connection is very sensitive to close distances. In addition to this difficulty, a major drawback of near-field lithography is the lack of modeling power. For rapid nanoscale modeling, molecule properties are performed by contact printing, parallel processes with console two-dimensional arrays or flexible polymer pen arrays for plasmonic nanoscale (10 nanometers), and fabrication of nanoelectronic devices.
The parallel process with a pen array was intended for only one array pattern of the same structure, because each array pen could not be activated separately. To generate nanoscale patterns on a larger scale, we need a probe array whose elements are activated separately. Using an array of nano-aperture probes in a parallel process is a promising way to achieve high-power, near-field optical lithography. However, in practice it is difficult to implement an optical probe array that holds thousands or millions of elements close to capture the field, because the distance between each probe and the pattern bed must be precisely maintained in the tens of nanometers. Each optical probe has an extra layer of solid film below the diaphragm so that it can physically contact the substrate and maintain gap spacing during the scan. For contact plasmon nanoparticles, an optical probe with a high-transmittance, wide-nano aperture in a metal film. To protect the diaphragm from contamination and wear, the optical probe is filled with a dielectric material in the hole and covered with a dielectric protective layer whose thickness is adjusted by the gap between the probe and the substrate. The electric field distribution in the entangled diaphragm structure in an aluminum film at a wavelength of less than 2 nm with a direct-axis polarized impact beam is calculated using nano-electron plasmonic contact lithography in the manufacture of nanoelectronic devices and tools. Realistic simulation process of modeling on the fabrication resistance of nanoelectronic devices and tools is the wavelength of the impact plate of the silicon glass dielectric medium. Which is transparent at the wavelength and easily covered with plasma chemical vapor deposition of nanoparticles.
Conclusion :
Plasmonic lithography system with nano-diaphragm contact probe in the form of (tangled) in a metal film plate coated at the bottom (dimensions less than 10 nm) , up to a 405 nm diode laser beam on Nano-focused diaphragm.
Researcher and author: Dr. ( Afshin Rashid)
PhD in Nano-Microelectronics