Investigating the focused nano plasmonic diaphragm method with the nano electric field distribution in the entangled diaphragm structure in an aluminum film at a wavelength less than 2 nm.

_ Department of  nanoelectronics and (plasmonic waves)

Investigating the  focused nano plasmonic diaphragm method with  the nano electric field distribution in the entangled diaphragm structure in an aluminum film at a wavelength less than 2 nm.

Researcher  and author: Dr.   (   Afshin Rashid)

Note: A plasmonic lithography system with a contact probe in  the form of a nano-diaphragm (entangled) in a metal film plate   covered  in the lower part (dimensions less than 10 nm)  ,  to a diode laser beam with a wavelength of 405 nm. focus on the nano aperture.  

The lithography system using such a high-transmission nano-aperture has achieved resolution below the diffraction limit, and has initiated the development of new designs of plasmonic nano-lithography.  To achieve high optical resolution, the distance between the aperture and the photo-resistance must be precisely within the range A few tens of nanometers should be maintained, because the near-field coupling is very sensitive to the distance.  In addition to this difficulty, a major drawback of near-field lithography is low patterning power. For rapid patterning of nanoscale, molecular features by contact printing, parallel processes with two-dimensional cantilever arrays or flexible polymer pen arrays for plasmonic nanolithography (10 nm) and making nanoelectronic devices are performed.

Parallel processing with a pen array was intended only for an array pattern of the same structure, since each pen of the array cannot be activated separately.  To produce nanoscale patterns on a larger scale, we need a probe array whose elements are individually actuated. Using an array of nano-aperture probes in a parallel process is a promising way to realize high-power, near-field optical lithography.  However, in practice, it is difficult to implement an optical probe array that holds thousands or millions of elements for near-field recording, because the distance between each probe and the pattern substrate must be precisely maintained in the range of tens of nanometers. Each optical probe has an additional solid thin film layer below the aperture to physically contact the substrate and maintain the gap distance during scanning. 

For contact-mode plasmonic nanolithography, an optical probe that has a wide, high-transmittance nano-aperture in a metal film.  To protect the diaphragm from contamination and wear, the optical probe is filled with a dielectric material in the hole and covered with a dielectric protective layer, the thickness of which is adjusted by the gap distance between the probe and the substrate. The distribution of the electric field in the interwoven diaphragm structure in an aluminum film at a wavelength of less than 2 nm with a direct polarized incident beam is calculated using plasmonic nanolithography in the contact state of the dimensions in the manufacture of nanoelectronic devices and devices for Simulating the realistic process of patterning on the resistance to  the manufacture of nanoelectronic devices and accessories  is the wave intensity of the impact plane of the dielectric medium of silica glass,  which is transparent and easily covered with plasma chemical vapor deposition of nanoparticles at the wavelength of the case.

Conclusion :

A plasmonic lithography system with a contact probe in the form of  a nano-aperture shaped (entangled) in a metal film plate   covered  in the lower part (dimensions less than 10 nm)  ,  to direct a diode laser beam with a wavelength of 405 nm onto Focusing nano diaphragm.  

Researcher  and author: Dr.   (   Afshin Rashid)

Specialized doctorate in nano-microelectronics