UV nano-lithography modeling method in the manufacture of nanoelectronic devices (mostly nano-optical devices) Wavelength of about 400 nm

UV nano-lithography modeling method in the manufacture of nanoelectronic devices (mostly nano-optical devices)  Wavelength of about 400 nm  (PhD in nano-microelectronics)

Researcher  and author: Dr.   (   Afshin Rashid)

Note: The method of modeling UV nano-lithography is in the manufacture of nanoelectronic devices and devices (most nano-optical devices). This method uses ultraviolet light with a wavelength of about 400 nm. 

Because the wavelength used determines to some extent the minimum line width, shorter wavelengths are required to produce smaller structures. Deep UV lithography uses lasers with a wavelength of 193 nm and can produce properties below 50 nm. Ultraviolet (13.5 nm) and X-rays are also used. Deep UV, ultraviolet and X-ray methods can create nanoscale structures, but are expensive due to the cost of the tools. The special requirements used for optical and photo-resistant masks increase the cost and complexity of the procedures.

 To  easily figured interfere with the beneficial aspects of using UV light sources are created. The advantage of this method is simplicity. The problem is creating complex shapes and arrays. Nanolithography is a branch of nanotechnology that studies and uses the construction of nanometer-scale structures — that is, creating patterns with at least one lateral dimension between the size of a single atom and approximately 100 nanometers. It is used in the construction of advanced semiconductor integrated circuits (nano-circuits) or nano-electromechanical systems (NEMS). Nano-lithography is a broad term used to describe various processes for creating nanoscale patterns in a variety of environments, the most common of which is silicon semiconductor materials. The predominant goal of nanolithography is to shrink electronic devices, which causes more electronic components to shrink into smaller spaces, that is, smaller integrated circuits that lead to smaller devices because they are faster and cheaper to produce because fewer materials are needed. It also increases performance and response time because electrons only have to travel very short distances.

Conclusion :

The method of modeling UV nano-lithography is in the manufacture of nanoelectronic devices (mostly nano-optical devices). This method uses ultraviolet light with a wavelength of about 400 nm. 

Researcher  and author: Dr.   (   Afshin Rashid)

PhD in Nano-Microelectronics