nanoplasmonic diaphragm method with nanoelectric field distribution in the entangled diaphragm structure in an aluminum film at a wavelength of less than 2 nm

 _ Nanoplasmonics and Nanoelectronics Model Section 

Nanoelectronics model and investigation of  focused nanoplasmonic diaphragm method with nanoelectric field distribution in the entangled diaphragm structure in an aluminum film at a wavelength of less than 2 nm

Researcher and Author: Dr.   (   Afshin Rashid)

Note: The plasmonic lithography system with a contact probe is  a nano-diaphragm-shaped (entangled) in a metal film plate   covered  in the lower part (dimensions less than 10 nm)  ,  to focus a diode laser beam with a wavelength of 405 nm onto the nano-diaphragm.  

Lithographic systems using such high-transmission nano-apertures have achieved sub-diffraction resolution, and have initiated the development of new designs of plasmonic nanolithography.  To achieve high optical resolution, the distance between the aperture and the photoresist must be precisely maintained in the range of a few tens of nanometers, because the near-field coupling is very sensitive to the distance.  In addition to this difficulty, a major drawback of near-field lithography is the low patterning power. For rapid patterning of nanoscale features, molecular features are printed by contact printing, parallel processes with two-dimensional cantilever arrays or flexible polymer pen arrays for plasmonic nanolithography (10 nm) and the fabrication of nanoelectronic devices.

The parallel process with a pen array was only intended for an array pattern of the same structure, because each pen of the array cannot be activated separately.  To produce nanoscale patterns on a larger scale, we need a probe array whose elements are activated separately. Using an array of nanoaperture probes in a parallel process is a promising way to realize high-throughput, near-field optical lithography.  However, in practice, it is difficult to implement an optical probe array that holds thousands or millions of elements for near-field recording, because the distance between each probe and the pattern substrate must be precisely maintained in the range of tens of nanometers. Each optical probe has an additional solid thin film layer under the diaphragm to physically contact the substrate and maintain the gap distance during scanning. 

For contact plasmonic nanolithography, an optical probe with a high-transmittance and wide-area nanodiaphragm is embedded in a metal film.  To protect the diaphragm from contamination and wear, the optical probe is filled with a dielectric material in the hole and covered with a dielectric protective layer whose thickness is controlled by the gap distance between the probe and the substrate. The electric field distribution in the interlaced diaphragm structure in an aluminum film at a wavelength of less than 2 nm is calculated by a direct-axis polarized beam using contact plasmonic nanolithography. Dimensions in the fabrication of nanoelectronic devices and accessories are calculated to simulate the realistic process of patterning on the resistance of  the fabrication of nanoelectronic devices and accessories.  The dielectric medium is silica glass,  which is transparent at the wavelength of interest and easily coated with plasma chemical vapor deposition of nanoparticles.

Conclusion:

The plasmonic lithography system with a contact probe is  a nanodiaphragm-shaped (entangled) in a metal film plate   covered  in the lower part (dimensions less than 10 nm)  ,  to focus a diode laser beam with a wavelength of 405 nm onto the nanodiaphragm.  

Researcher  and Author: Dr.   (   Afshin Rashid)

Specialized PhD in Nano-Microelectronics