Plasmon nano-lithography system (dimensions less than 10 nm) and its benefits in nanoelectronic technology

Plasmon nano-lithography system (dimensions less than 10 nm) and its benefits in nanoelectronic technology (PhD in nano-microelectronics)

Researcher  and author: Dr.   (   Afshin Rashid)

Note: A plasmonic lithography system with a nano-diaphragm contact probe in the shape (tangled) on a metal film plate  coated at the bottom  (dimensions less than 10 nm) to   produce a 405 nm diode laser beam Focus on the nano diaphragm.   

Lithographic systems using such high-resolution nano-aperture transitions have achieved below-resolution diffraction, and have begun developing new designs of plasmonic nanolithography.  To achieve high optical resolution, the distance between the aperture and the image resistance must be exactly within Save a few tens of nanometers, because the field connection is very sensitive to close distances. In addition to this difficulty, a major drawback of near-field lithography is the lack of modeling power. For fast nanoscale modeling, molecule properties are performed by contact printing, parallel processes with console two-dimensional arrays or flexible polymer pen arrays for plasmonic nanoscale (10 nanometers), and fabrication of nanoelectronic devices.

The parallel process with a pen array was intended only for an array pattern of the same structure, because each array pen could not be activated separately. To generate nanoscale patterns on a larger scale, we need a probe array whose elements are activated separately. Using an array of nano-aperture probes in a parallel process is a promising way to achieve high-power, near-field optical lithography. However, in practice, it is difficult to implement an array of optical probes that hold thousands or millions of elements close to capture the field, because the distance between each probe and the pattern bed must be accurately maintained in the tens of nanometers. Each optical probe has an additional layer of solid film below the diaphragm so that it can physically contact the substrate and maintain gap gaps during scanning. 

For contact plasmon nano-lithography, an optical probe with a nano-aperture with high transmittance and width in a metal film. To protect the diaphragm from contamination and wear, the optical probe is filled with a dielectric material in the hole and covered with a dielectric protective layer whose thickness is adjusted by the gap between the probe and the substrate. The electric field distribution in the entangled diaphragm structure in an aluminum film at a wavelength of less than 2 nm with a direct-axis polarized impact beam is calculated using nano-contact plasmonic nano-lithography in the manufacture of nanoelectronic devices and tools. Simulation of a realistic modeling process on the  fabrication resistance of nanoelectronic devices and tools is the wave intensity of the impact plate of a  silica glass dielectric medium. Which is transparent about the wavelength and easily covered with plasma chemical vapor deposition of nanoparticles.

Conclusion :

Plasmonic lithography system with nano-diaphragm contact probe  in the shape (tangled) in a metal film plate  coated at the bottom  (dimensions less than 10 nm) ,   up to a 405 nm diode laser beam on Nano-focused diaphragm.   

Researcher  and author: Dr.   (   Afshin Rashid)

PhD in Nano-Microelectronics